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Surface and Interface Analysis

Volumn 33, Issue 4, 2002, Pages 318-321

Detachment of alumina films from aluminium by 100 keV H+ ions

(9) Liu, Y a Alexander, M a Koroleva, E a Skeldon, P a Thompson, G E a Bailey, P b Noakes, T C Q b Shimizu, K c Habazaki, H d

a UNIVERSITY OF MANCHESTER (United Kingdom)

b DARESBURY LABORATORY (United Kingdom)

c KEIO UNIVERSITY (Japan)

d HOKKAIDO UNIVERSITY (Japan)

Author keywords

Aluminium; H+ ions; Irradiation damage; Medium energy ions; Oxide films

Indexed keywords

ALUMINA; ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; HYDROGEN; INTERFACES (MATERIALS); ION BEAMS; IRRADIATION; POSITIVE IONS;

ANODIC OXIDE FILMS; IRRADIATION DAMAGES;

METALLIC FILMS;

EID: 0036535429 PISSN: 01422421 EISSN: None Source Type: Journal
DOI: 10.1002/sia.1197 Document Type: Article

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.