SCOPUS 정보 검색 플랫폼

Nanotechnology

Volumn 20, Issue 18, 2009, Pages

A novel method for fabricating sub-16 nm footprint T-gate nanoimprint molds

(3) Peng, Can a Liang, Xiaogan a Chou, Stephen Y a

a Princeton University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-SPEED TRANSISTORS; NANO-IMPRINT LITHOGRAPHIES; NANOIMPRINT MOLDS; NOVEL METHODS; REACTIVE IONS; T-GATES; T-SHAPED GATES;

ELECTRON BEAMS; MOLDS; REACTIVE ION ETCHING;

NANOIMPRINT LITHOGRAPHY;

NANOMATERIAL;

ARTICLE; ELECTRON BEAM; NANOFABRICATION; NANOTECHNOLOGY; PRESSURE; PRIORITY JOURNAL; SEMICONDUCTOR; VAPOR; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; EQUIPMENT; EQUIPMENT DESIGN; EVALUATION; INSTRUMENTATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; SIGNAL PROCESSING; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SIGNAL PROCESSING, COMPUTER-ASSISTED; SURFACE PROPERTIES; TRANSISTORS;

EID: 65549113366 PISSN: 09574484 EISSN: 13616528 Source Type: Journal
DOI: 10.1088/0957-4484/20/18/185302 Document Type: Article

Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.