Deposition and wear resistance of composite TiBC-SiC coatings on Si wafer by thermal plasma CVD

Journal of the Ceramic Society of Japan

Volumn 117, Issue 1364, 2009, Pages 415-420

  Shimada, Shiro ^a   Fuji, Yusuke ^a   Kiyono, Hajime ^a   Tsujino, Jiro ^b   Yamazaki, Isao ^c  

^a HOKKAIDO UNIVERSITY   (Japan)

^b Hokkaido Electric Power Co Inc   (Japan)

^c Hokkaido Sumiden Precision Industries Ltd   (Japan)

Author keywords

Composite; CVD; Thermal plasma; TiBC SiC; Wear resistance

Indexed keywords

ALUMINA; CHEMICAL VAPOR DEPOSITION; COATINGS; COMPOSITE COATINGS; COMPOSITE MATERIALS; ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; PLASMA CVD; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; SILICON WAFERS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

BALL-ON-DISK WEAR TESTS; CROSS SECTIONAL PROFILES; CRYSTALLINE PHASIS; GRAZING INCIDENCE X-RAY DIFFRACTION; MIXED SOLUTION; THERMAL PLASMA; THERMAL PLASMA CVD; TIBC-SIC;

WEAR RESISTANCE;

EID: 65449160150     PISSN: 18820743     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj2.117.415     Document Type: Article

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