Fluorine-and siloxane-containing polymers for supercritical carbon dioxide lithography

Polymer International

Volumn 58, Issue 3, 2009, Pages 302-306

  Sha, Jing ^a   Ober, Christopher K ^a  

^a Cornell University   (United States)

Author keywords

Fluorine; Lithography; Siloxane; Supercritical carbon dioxide

Indexed keywords

ENVIRONMENTALLY FRIENDLY SOLVENTS; LITHOGRAPHIC PATTERNING; MOLECULAR GLASS; SILOXANE; SUPERCRITICAL CARBON DIOXIDE; VERY HIGH RESOLUTIONS;

CARBON DIOXIDE; FLUORINE; FLUORINE CONTAINING POLYMERS; METAL CASTING; PHOTORESISTS; POLYMERS;

SUPERCRITICAL FLUID EXTRACTION;

CARBON DIOXIDE; GLASS; POLYSILOXANE; SOLVENT;

EID: 65349108642     PISSN: 09598103     EISSN: 10970126     Source Type: Journal    
DOI: 10.1002/pi.2533     Document Type: Short Survey

References (14)

1. Felix NM, Tsuchiya K and Ober CK, Adv Mater 18:442 (2006).
2. Sundararajan N, Yang S, Ogino K, Valiyaveettil S, Wang J, et al, Chem Mater 12:41 (2000).
3. Pham VQ, Ferris RJ, Hamad A and Ober CK, Chem Mater 15:4893 (2003).
4. Pham VQ, Nguyen PT, Weibel GL, Ferris RJ and Ober CK, Polym Prepr 43:885 (2002).
5. Boggiano MK, Vellenga D, Carbonell R, Ashby VS and DeSimone JM, Polymer 47:4012 (2006).
6. Gallagher-Wetmore PM, Wallraff GM and Allen RD, Proc SPIE Int Soc Opt Eng 2438:694 (1995).
7. Ober CK, Gabor AH, Gallagher-Wetmore PM and Allen RD, Adv Mater 9:1039 (1997).
8. Gabor AH and Ober CK, Microelectron Technol 614:281 (1995).
9. Gabor AH, Pruette LC and Ober CK, Chem Mater 8:2282 (1996).
10. Malliaras GG and Friend RH, Phys Today 58:53 (2005).
11. Hwang HS, Zakhidov AA, Lee J-K, Andre X, DeFranco JA, et al, J Mater Chem 18:3087 (2008).
12. Lewis HGP, Weibel GL, Ober CK and Gleason KK, Chem Vap Deposition 7:195 (2001).
13. Mao Y and Gleason KK, Langmuir 20:2484 (2004).
14. Mao Y, Felix NM, Nguyen PT, Ober CK and Gleason KK, Chem Vap Deposition 12:259 (2006).