SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 9, Issue 13, 1997, Pages 1039-1043

Imaging polymers with supercritical carbon dioxide

(4) Ober, Christopher K a Gabor, Allen H a,d Gallagher Wetmore, Paula b Allen, Robert D c

a Cornell University (United States)

b Phasex Corporation (United States)

c IBM ALMADEN RESEARCH CENTER (United States)

d Olin Microelectronic Materials (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; COPOLYMERIZATION; FLUORINE CONTAINING POLYMERS; NANOSTRUCTURED MATERIALS; ORGANIC SOLVENTS; PHOTOLITHOGRAPHY; PLASTIC FILMS; POLYACRYLATES; PRESSURE; SILICONES; SOLUBILITY; THERMAL EFFECTS;

SUPERCRITICAL CARBON DIOXIDE;

BLOCK COPOLYMERS;

EID: 0031551670 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/adma.19970091309 Document Type: Article

Times cited : (40)

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