Hydration and reduction of molecular beam epitaxy grown vo x/α-fe 2o 3(0001): ambient pressure study

Journal of Physical Chemistry C

Volumn 113, Issue 4, 2009, Pages 1406-1410

  Kim, Chang Yong ^a   Klug, Jeffrey A ^b   Stair, Peter C ^a   Bedzyk, Michael J ^a  

^a Department of Physics and Astronomy ^*

^b NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION GEOMETRIES; ADSORPTION SITES; AMBIENT ENVIRONMENTS; AMBIENT PRESSURES; HYDRATED OXIDES; HYDROGEN ANNEALING; HYDROGEN REDUCTIONS; REDUCTION PROCESS; SUPPORTED VANADIUM OXIDES; SURFACE ADSORPTIONS; X-RAY FLUORESCENCE SPECTROSCOPIES; X-RAY PHOTOELECTRON SPECTROSCOPIES; X-RAY STANDING WAVES;

CRYSTAL GROWTH; GAS ADSORPTION; HYDRATES; HYDRATION; HYDROGEN; MOLECULAR BEAMS; MOLECULAR DYNAMICS; MOLECULAR SPECTROSCOPY; OXYGEN; TRANSITION METALS; TUNNELING (EXCAVATION); VANADIUM; VANADIUM ALLOYS; VANADIUM COMPOUNDS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 65249150792     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp804133s     Document Type: Article

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