External compression-induced fracture patterning on the surface of poly(dimethylsiloxane) cubes and microspheres

Langmuir

Volumn 25, Issue 5, 2009, Pages 3102-3107

  Uchida, Tomoyuki ^a   Mills, K L ^a   Kuo, Chuan Hsien ^a   Ron, Whijae ^a   Tung, Yi Chung ^a   Garner, Amanda L ^b   Koide, Kazunori ^b   Thouless, M D ^a   Takayama, Shuichi ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b UNIVERSITY OF PITTSBURGH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

3-D OBJECTS; COMPLIANT SUBSTRATES; CRACK PATTERNS; CROSS-SECTIONAL AREAS; DIFFERENT MECHANISMS; FINITE-ELEMENT SIMULATIONS; FRACTURE PATTERNS; FRICTIONAL CONTACTS; FUTURE APPLICATIONS; GEOMETRICAL EFFECTS; OXYGEN PLASMAS; PATTERN FORMATIONS; POLY(DIMETHYLSILOXANE); SELECTIVE DEPOSITIONS; STRESS DISTRIBUTIONS; SUB MICROMETERS; SURFACE LAYERS; SURFACE PATTERNS; SURFACE-MODIFIED;

MICROSPHERES; OXYGEN; SILICONES; STRESS CONCENTRATION; SURFACES; TENSILE STRESS;

CRACKS;

3 AMINOPROPYLTRIETHOXYSILANE; ACETONITRILE; ACETONITRILE DERIVATIVE; AMINE; BAYSILON; DIMETICONE; GAMMA-AMINOPROPYLTRIETHOXYSILANE; ION; MICROSPHERE; SILANE DERIVATIVE; SILICON DIOXIDE;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; COLLOID; COMPRESSIVE STRENGTH; DIFFUSION; METHODOLOGY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SURFACE PROPERTY; THIN LAYER CHROMATOGRAPHY;

ACETONITRILES; AMINES; CHROMATOGRAPHY, THIN LAYER; COLLOIDS; COMPRESSIVE STRENGTH; DIFFUSION; DIMETHYLPOLYSILOXANES; IONS; MAGNETIC RESONANCE SPECTROSCOPY; MICROSPHERES; MODELS, CHEMICAL; SILANES; SILICON DIOXIDE; SURFACE PROPERTIES;

EID: 65249093027     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la801986k     Document Type: Article

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