Ordered nanostructures written directly by laser interference

Nanotechnology

Volumn 20, Issue 12, 2009, Pages

  Tan, C ^a   Peng, C S ^a   Pakarinen, J ^a   Pessa, M ^a   Petryakov, V N ^b   Verevkin, Yu K ^b   Zhang, J ^c   Wang, Z ^c   Olaizola, S M ^d   Berthou, T ^e   Tisserand, S ^e  

^a TAMPERE UNIVERSITY OF TECHNOLOGY   (Finland)

^b INSTITUTE OF APPLIED PHYSICS   (Russian Federation)

^c CARDIFF UNIVERSITY   (United Kingdom)

^d CEIT   (Spain)

^e SILIOS Technologies SA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION PROCESS; FOUR-BEAM INTERFERENCES; GAAS; LASER INTERFERENCE LITHOGRAPHIES; LASER INTERFERENCES; PERIODIC ARRAYS; SIMPLIFIED METHODS;

SILICON COMPOUNDS;

NANOSTRUCTURES;

ARSENIC; GALLIUM; NANOMATERIAL; SILICON DIOXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; COST EFFECTIVENESS ANALYSIS; LASER; LASER INTERFERENCE LITHOGRAPHY; NANOFABRICATION; NANOTECHNOLOGY; NONHUMAN; OXYGENATION; PARTICLE SIZE; PATTERN GENERATOR; PRIORITY JOURNAL; PROCESS DESIGN; TRANSMISSION ELECTRON MICROSCOPY;

EID: 65149100308     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/12/125303     Document Type: Article

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