High-resolution thermal processing of semiconductors using pulsed-laser interference patterning

Physica Status Solidi (A) Applied Research

Volumn 166, Issue 2, 1998, Pages 651-657

  Kelly, M K ^a   Rogg, J ^a   Nebel, C E ^a   Stutzmann, M ^a   Katai Sz ^b  

^a WALTER SCHOTTKY INSTITUT   (Germany)

^b BUDAPEST UNIVERSITY OF TECHNOLOGY AND ECONOMICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT INTERFERENCE; PHOTOLITHOGRAPHY; PULSED LASER APPLICATIONS; PYROLYSIS; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE;

PULSED LASER INTERFERENCE PATTERNING; THERMAL PATTERNING;

SEMICONDUCTING FILMS;

EID: 0032049826     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-396X(199804)166:2<651::AID-PSSA651>3.0.CO;2-P     Document Type: Article

References (6)

1. Pulsed Laser Processing of Semiconductors, Semiconductors and Semimetals Series, Vol. 23 Eds. R. F. WOOD, C. W. WHITE, and R. T. YOUNG, Academic Press, New York 1984.
2. M. K. KELLY, C. E. NEBEL, M. STUTZMANN, and G. BÖHM, Appl. Phys. Lett. 68, 1984 (1996).
3. M. K. KELLY and B. DAHLHEIMER, phys. stat. sol. (a) 156, K13 (1996).
4. C. E. NEBEL, J. ROGG, M. K. KELLY, B. DAHLHEIMER, M. ROTHER, M. BICHLER, W. WEGSCHEIDER, and M. STUTZMANN, J. Appl. Phys. 82, 1497 (1997). J. ROGG, M. K. KELLY, C. E. NEBEL, M. STUTZMANN, W. WEGSCHEIDER, and M. BICHLER, unpublished.
5. C. E. NEBEL, J. ROGG, M. K. KELLY, B. DAHLHEIMER, M. ROTHER, M. BICHLER, W. WEGSCHEIDER, and M. STUTZMANN, J. Appl. Phys. 82, 1497 (1997). J. ROGG, M. K. KELLY, C. E. NEBEL, M. STUTZMANN, W. WEGSCHEIDER, and M. BICHLER, unpublished.
6. M. K. KELLY, O. AMBACHER, B. DAHLHEIMER, G. GROOS, R. DIMITROV, H. ANGERER, and M. STUTZMANN, Appl. Phys. Lett. 69, 1749 (1996).