Fabrication of photonic crystals on several kinds of semiconductor materials by using focused-ion beam method

Thin Solid Films

Volumn 515, Issue 22, 2007, Pages 8297-8300

  Xu, Xingsheng ^a   Chen, Hongda ^a   Xiong, Zhigang ^b   Jin, Aizi ^b   Gu, Changzhi ^b   Cheng, Bingying ^b   Zhang, Daozhong ^b  

^a INSTITUTE OF SEMICONDUCTORS   (China)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

Focused ion beam; Photonic crystal; Semiconductor

Indexed keywords

FABRICATION; ION BEAMS; SEMICONDUCTOR MATERIALS; WAVELENGTH DIVISION MULTIPLEXING;

FOCUSED-ION BEAMS; PHOTONIC CRYSTAL WAVELENGTH DIVISION MULTIPLEXERS;

PHOTONIC CRYSTALS;

EID: 34547743065     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.061     Document Type: Article

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