Burst-mode femtosecond pulsed laser deposition for control of thin film morphology and material ablation

Applied Physics Express

Volumn 2, Issue 4, 2009, Pages 0425011-0425013

  Murakami, Makoto ^a   Liu, Bing ^a   Hu, Zhendong ^a   Liu, Zhenlin ^a   Uehara, Yuzuru ^a   Che, Yong ^a  

^a IMRA AMERICA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION THRESHOLDS; ALTERNATIVE APPROACHES; ATOMICALLY SMOOTH SURFACES; BURST MODES; CONTINUOUS TUNABILITY; EPITAXIAL THIN FILMS; FEMTO SECOND LASER PULSE; FEMTOSECOND PULSED-LASER DEPOSITIONS; LASER PARAMETERS; LASER-MATTER INTERACTIONS; MATERIAL ABLATIONS; NANOPARTICLE AGGREGATES; PLASMA IONIZATIONS; PULSE ENERGIES; PULSED LASERS; THIN-FILM MORPHOLOGIES; TUNABILITY; WIDE-BAND GAP SEMICONDUCTORS;

ABLATION; EPITAXIAL FILMS; LASERS; NANOPARTICLES; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; ULTRASHORT PULSES;

SEMICONDUCTOR LASERS;

EID: 64749116308     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.2.042501     Document Type: Article

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