Self-consistent particle modeling of inductively coupled CF4 discharges and radical flow

IEEE Transactions on Plasma Science

Volumn 34, Issue 3 PART 3, 2006, Pages 973-983

  Takekida, Hideto ^a   Nanbu, Kenichi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Carbon tetrafluoride; Inductively coupled plasma; Particle in cell Monte Carlo (PIC MC) simulation

Indexed keywords

AXI-SYMMETRICAL; CARBON TETRAFLUORIDE; DIRECT SIMULATION MONTE CARLO METHODS; DOMINANT NEGATIVES; ELECTRON DENSITIES; ELECTRON ENERGY DISTRIBUTIONS; GAS PRESSURES; GLOBAL MODELS; INPUT DATUM; MAXWELLIAN DISTRIBUTIONS; PARTICLE MODELING; PARTICLE-IN-CELL/MONTE CARLO (PIC/MC) SIMULATION; PARTICLE-IN-CELL/MONTE CARLO METHODS; PLASMA POTENTIALS; POWER DEPOSITIONS; PRODUCTION RATES; SPATIAL DISTRIBUTIONS;

CARRIER CONCENTRATION; ELECTRIC DISCHARGES; ELECTRON DENSITY MEASUREMENT; ELECTRON TEMPERATURE; ELECTRONS; FLOW SIMULATION; GASES; INDUCTIVELY COUPLED PLASMA; MONTE CARLO METHODS; PHOTORESISTS;

DENSITY OF GASES;

EID: 64749093116     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2006.875730     Document Type: Article

References (35)

1. M. A. Lieberman and J. Lichtenberg, Principles of Plasma Discharges and Materials Processing. New York: Willey, 1994, ch. 15.
2. W. Coburn and M. Chen, "Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density," J. Appl. Phys., vol. 51, pp. 3134-3136, 1980.
3. 1 RF plasma," J. Appl. Phys., vol. 66, pp. 5251-5257, 1989.
4. 1 plasma," J. Appl. Phys., vol. 70, pp. 2939-2946, 1991.
5. 3 using microwave resonance and the photodetachment effect," J. Appl. Phys., vol. 70, pp. 3472-3480, 1991.
6. 3 discharge duration," J. Phys. D, Appl. Phys. vol. 28, pp. 884-887, 1993.
7. 2 in high-density plasmas," J. Appl. Phys., vol. 76, pp. 5967-5974, 1994.
8. 1 discharge with implementation of all ion-neutral reactive collisions," J. Vac. Sci. Technol. A, vol. 16, pp. 1201-1206, 1998.
9. 1," Jpn. J. Appl. Phys., vol. 38, pp. 4416-4422, 1999.
10. 1 discharge: Effect of gas pressure," Jpn. J. Appl. Phys., vol. 39, pp. 2804-2808, 2000.
11. 1 inductively coupled plasma," J. Vac. Sci. Technol. A, vol. 19, pp. 718-729, 2001.
12. 1 discharge," J. Appl. Phys., vol. 92, pp. 1780-1787, 2002.
13. D. B. Hash, D. Bose, M. V. S. Rao, B. A. Cruden, M. Meyyappan, and S. P. Sharma, "Impact of gas heating in inductively coupled plasmas," J. Appl. Phys., vol. 90, pp. 2148-2157, 2001.
14. D. Bose, D. B. Hash, T. R. Govindan, and M. Meyyappan, "Modeling of inductively coupled plasma processing reactors," J. Phys. D, Appl. Phys., vol. 34, pp. 2742-2747, 2001.
15. C. K. Birdsall and A. B. Langdon, Plasma Physics via Computer Simulation. New York: McGraw-Hill, 1985.
16. K. Nanbu, "Probability theory of electron-molecule, ion-molecule, molecule-molecule, and Coulomb collisions for particle modeling of materials processing plasmas and gases," IEEE Trans. Plasma Sci., vol. 28, pp. 971-990, Jun. 2000.
17. G. A. Bird, Molecular Gas Dynamics and Direct Simulation of Gas Flows Oxford, U.K.: Clarendon, 1994.
18. M. M. Turner, "Collisionless electron heating in an inductively coupled discharge," Phys. Rev. Lett., vol. 71, pp. 1844-1847, 1993.
19. V. I. Kolobov and D. J. Economou, "The anomalous skin effect in gas discharge plasmas," Plasma Sources Sci. Technol., vol. 6, pp. R1-R17, 1997.
20. M. A. Lieberman and V. A. Godyak, "From Fermi acceleration to collisionless discharge heating," IEEE Trans. Plasma Sci., vol. 26, no. 3, pp. 955-986, Jun. 1998.
21. V. A. Godyak, R. B. Piejak, and B. M. Alexandrovich, "Electrical characteristics and electron heating mechanism of an inductively coupled argon discharge," Plasma Sources Sci. Technol., vol. 3, pp. 169-176, 1994.
22. H. Takekida and K. Nanbu, "Particle modeling of non-collisional heating in inductively coupled argon plasmas," Thin Solid Films, 2005.
23. M. Shiozawa and K. Nanbu, "Coupling of plasma and flow in materials processing," Thin Solid Films, vol. 457, pp. 48-54, 2004.
24. D. A. Anderson, J. C. Tannehill, and R. H. Pletcher, Computational Fluid Mechanics and Heat Transfer. New York: McGraw-Hill, 1984.
25. A. Ueda, Computer Simulation (in Japanese). Tokyo, Japan: Asakura-shoten, 1991.
26. K. Nanbu, "Particle modeling of nonequibrium plasmas and gases for materials processing," Recent Res. Develop. Vac. Sci. Technol., vol. 5, pp. 1-57, 2004.
27. 1," in Proc. 21st Conf. Phenomena in Ionized Gases, Bochum, Germany, 1993, vol. 1, p. 385.
28. K. Nanbu, "Simple method to determine collisional event in Monte Carlo simulation of electron-molecule collision," Jpn. J. Appl. Phys., vol. 33, pp. 4752-4753, 1994.
29. K. Nanbu and Y. Kitatani, "An ion-neutral species collision model for particle simulation of glow discharge," J. Phys. D, Appl. Phys., vol. 28, pp. 324-330, 1995.
30. A. A. Radzig and B. M. Simonov, Reference Data on Atoms, Molecules, and Ions. Berlin, Germany: Springer, 1985.
31. K. Nanbu and K. Denpoh, "Monte Carlo simulation of positive-negative ion recombination for given rate constant," J. Soc. Jpn., vol. 67, pp. 1288-1290, 1998.
32. 1 into neutral radicals," Jpn. J. Appl. Phys., vol. 31, pp. 2919-2924, 1992.
33. 2 radicals in etching chamber," Jpn. J. Appl. Phys., vol. 32, pp. L353-L356, 1993.
34. R. E. P. Harvey, W. N. G. Hitchon, and G. J. Parker, "The role of the plasma in chemistry of low pressure plasma etchers," IEEE Trans. Plasma Sci., vol. 23, no. 3, pp. 936-952, Jun. 1995.
35. H. Takekida and K. Nanbu, "Weighting factor for particle modeling of aximmetrical low temperature plasmas," J. Phys. Soc. Jpn., vol. 73, pp. 756-757, 2004.