Statistical process monitoring of nonlinear profiles using wavelets

Journal of Quality Technology

Volumn 41, Issue 2, 2009, Pages 198-212

  Chicken, Eric ^a,c   Pignatiello Jr , Joseph J ^a,c   Simpson, James R ^b,d  

^a FLORIDA STATE UNIVERSITY   (United States)

^b AIR FORCE RESEARCH LABORATORY   (United States)

^c Department of Statistics ^*  (United States)

^d USAF   (United States)

Author keywords

Average run length; Change point; Control charts; Likelihood ratio; Nonlinear; Semiparametric; Statistical process control; Wavelet thresholding

Indexed keywords

CHEMICAL INDUSTRY; CONTROL CHARTS; INTELLIGENT SYSTEMS; MONTE CARLO METHODS; PROCESS CONTROL; PROCESS MONITORING; PROFILOMETRY; RADAR; SEMICONDUCTOR DEVICE MANUFACTURE;

AVERAGE RUN LENGTHS; CHANGE-POINTS; LIKELIHOOD RATIOS; NONLINEAR; SEMIPARAMETRIC; WAVELET THRESHOLDING;

STATISTICAL PROCESS CONTROL;

EID: 64549155317     PISSN: 00224065     EISSN: None     Source Type: Journal    
DOI: 10.1080/00224065.2009.11917773     Document Type: Article

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