Timing analysis and optimization implications of bimodal CD distribution in double patterning lithography

Proceedings of the Asia and South Pacific Design Automation Conference, ASP-DAC

Volumn , Issue , 2009, Pages 486-491

  Jeongt, Kwangok ^a   Kahngt, Andrew B ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

32NM NODES; ADJACENT FEATURES; CD VARIATIONS; CDS; CLOCK DISTRIBUTIONS; CRITICAL DIMENSIONS; CURRENT PRODUCTIONS; DATA PATHS; DOUBLE PATTERNING; GUARD BANDS; MASK LAYOUTS; MEMORY PRODUCTS; PATH DELAYS; PHYSICAL DESIGNS; POTENTIAL IMPACTS; TIMING ANALYSIS; UNIMODAL;

COMPUTER AIDED DESIGN; DIGITAL INTEGRATED CIRCUITS; TIME MEASUREMENT;

DATA STORAGE EQUIPMENT;

EID: 64549144167     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASPDAC.2009.4796527     Document Type: Conference Paper

References (13)

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