Nanoscale patterning of NiFe surface by scanning probe microscopy scratch nanolithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 2, 2009, Pages 953-957

  Miyashita, Kazuya ^a   Nishimura, Shinya ^a   Toyofuku, Takashi ^a   Shirakashi, Jun Ichi ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT AIRS; APPLIED FORCES; DIRECT MODIFICATIONS; ELECTRICAL PROPERTIES; FABRICATION TECHNOLOGIES; FERROMAGNETIC METALS; FERROMAGNETIC TUNNEL JUNCTIONS; NANO-SCALE; NANO-SCALE DEVICES; NANO-SCALE PATTERNING; NI SURFACES; SCANNING PROBES; SCANNING-PROBE MICROSCOPIES;

ELECTRIC PROPERTIES; FABRICATION; FERROMAGNETIC MATERIALS; FERROMAGNETISM; MATERIALS PROPERTIES; NANOLITHOGRAPHY; NANOSTRUCTURED MATERIALS; PROBES; SCANNING; SCANNING ELECTRON MICROSCOPY; SCANNING PROBE MICROSCOPY; TUNNEL JUNCTIONS;

SURFACES;

EID: 64549138997     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3077488     Document Type: Article

References (22)

1. Y. Tomoda, Y. Shibata, J. Shirakashi, and Y. Takemura, J. Appl. Phys. 0021-8979 10.1063/1.2172575 99, 08T312 (2006).
2. Y. Tomoda, S. Kayashima, T. Ogino, M. Motoyama, Y. Takemura, and J. Shirakashi, J. Magn. Magn. Mater. 310, e641 (2007). 0304-8853
3. J. Shirakashi, K. Matsumoto, N. Miura, and M. Konagai, Appl. Phys. Lett. 0003-6951 10.1063/1.121218 72, 1893 (1998).
4. M. Faucher, T. Fournier, B. Pannetier, C. Thirion, W. Wernsdorfer, J. C. Villegier, and V. Bouchiat, Physica C 0921-4534 10.1016/S0921-4534(01)01168-6 368, 211 (2002).
5. X. Jin and W. N. Unertl, Appl. Phys. Lett. 0003-6951 10.1063/1.107813 61, 657 (1992).
6. Y. Kim and C. M. Lieber, Science 0036-8075 10.1126/science.257.5068.375 257, 375 (1992).
7. S. Yamamoto, H. Yamada, and H. Tokumoto, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.34.3396 34, 3396 (1995).
8. T. H. Fang, W. J. Chang, and C. M. Lin, Microelectron. Eng. 77, 389 (2005).
9. T. Sumomogi, T. Endo, K. Kuwahara, R. Kaneko, and T. Miyamoto, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.587660 12, 1876 (1994).
10. C. K. Hyon, S. C. Choi, S. W. Hwang, D. Ahm, Y. Kim, and E. K. Kim, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.38.7257 38, 7257 (1999).
11. L. Santinacci, T. Djenizian, and P. Schmuki, Appl. Phys. Lett. 0003-6951 10.1063/1.1404195 79, 1882 (2001).
12. L. Santinacci, Y. Zhang, and P. Schmuki, Surf. Sci. 597, 11 (2005). 0039-6028
13. B. Bhushan and V. N. Koinkar, J. Appl. Phys. 0021-8979 10.1063/1.355601 75, 5741 (1994).
14. B. Bhushan, Wear 251, 1105 (2001). 0043-1648
15. T. Ogino, S. Nishimura, and J. Shirakashi, Jpn. J. Appl. Phys., Part 1 46, 6908 (2007). 0021-4922
16. T. Ogino, S. Nishimura, and J. Shirakashi, Jpn. J. Appl. Phys., Part 1 47, 712 (2008). 0021-4922
17. J. F. Archard, J. Appl. Phys. 0021-8979 10.1063/1.1721448 24, 981 (1953).
18. C. Cheung, F. Djuanda, U. Erb, and G. Palumdo, Nanostruct. Mater. 0965-9773 10.1016/0965-9773(95)00264-F 5, 513 (1995).
19. H. Deng, M. K. Minor, and J. A. Barnard, IEEE Trans. Magn. 32, 3702 (1996). 0018-9464
20. R. L. White, E. Schreck, and R. H. Wang, IEEE Trans. Magn. 0018-9464 10.1109/20.477559 32, 110 (1996).
21. R. W. Siegel and G. E. Fougere, Nanostruct. Mater. 0965-9773 10.1016/0965-9773(95)00044-5 6, 205 (1995).
22. K. H. Chung and D. E. Kim, Tribol. Lett. 1023-8883 10.1023/A: 1024457132574 15, 135 (2003).