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Journal of Applied Physics

Volumn 105, Issue 6, 2009, Pages

Investigation of stability of the effective work function on LaAlO 3 and La2Hf2O7

(4) Suzuki, Masamichi a Kinoshita, Atsuhiro a Schimizu, Tatsuo a Koyama, Masato a

a TOSHIBA CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANOMALOUS PHENOMENON; EFFECTIVE WORK FUNCTIONS; FORMING GAS ANNEALING; GATE DIELECTRIC STACKS; GATE ELECTRODES; HIGH-K MATERIALS; OXYGEN-VACANCY;

ANNEALING; GATE DIELECTRICS; GATES (TRANSISTOR); HAFNIUM; LANTHANUM; OXYGEN; PLATINUM; REFRACTORY METAL COMPOUNDS; SILICON; SILICON OXIDES; WORK FUNCTION;

DIELECTRIC MATERIALS;

EID: 63749118040 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3097776 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.