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Volumn 393, Issue 8, 2009, Pages 1857-1861
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TOF-SIMS depth profiling and element mapping on oxidized AlCrVN hard coatings
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Author keywords
AlCrVN; Depth profiling; Element mapping; Hard coatings; TOF SIMS; Vanadium oxides
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Indexed keywords
ALUMINA;
ALUMINUM;
CESIUM;
CESIUM COMPOUNDS;
CHROMIUM;
CLUSTER ANALYSIS;
DEPTH PROFILING;
ELECTRODEPOSITION;
HIGH PERFORMANCE LIQUID CHROMATOGRAPHY;
MASS SPECTROMETERS;
OXIDES;
PHASE STRUCTURE;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
THICKNESS MEASUREMENT;
TRANSITION METALS;
VANADIUM ALLOYS;
VANADIUM COMPOUNDS;
ALCRVN;
APPLIED BIAS VOLTAGES;
ARC EVAPORATIONS;
CHEMICAL COMPOSITIONS;
COATING THICKNESS;
COMMERCIAL COATINGS;
DEPTH DISTRIBUTIONS;
ELEMENT MAPPING;
FACE-CENTERED CUBIC;
HEXAGONAL CLOSE-PACKED;
LOW BIAS;
OXIDATION BEHAVIORS;
OXIDIZED COATINGS;
SI(1 0 0 );
SINGLE-PHASE STRUCTURES;
TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRIES;
TOF-SIMS;
VANADIUM OXIDES;
HARD COATINGS;
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EID: 63449131705
PISSN: 16182642
EISSN: 16182650
Source Type: Journal
DOI: 10.1007/s00216-008-2525-7 Document Type: Article |
Times cited : (7)
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References (15)
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