Advanced micromechanical prototyping in polysilicon and SOI

IEE Colloquium (Digest)

Volumn , Issue 32, 2000, Pages 41-44

  McNie, M E ^a   Davies, R R ^a   Price, N ^a   King, D O ^a   Brunson, K M ^a  

^a DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

MECHANICAL LAYERS; PRESSURE INJECTION TECHNQIUES; PROTOTYPING SERVICES; SACRIFICIAL SURFACE MICROMACHINING (SSM);

ASPECT RATIO; CMOS INTEGRATED CIRCUITS; ETCHING; MICROELECTRONICS; MICROMACHINING; POLYSILICON; SILICON ON INSULATOR TECHNOLOGY; TRANSDUCERS;

MICROELECTROMECHANICAL DEVICES;

EID: 6344286113     PISSN: 09633308     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (10)

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4. E Becker et al, "Fabrication of Microstructures with High Aspect Ratios and Great Structural Heights by Synchrotron Radiation Lithography, Galvanoforming and Plastic Moulding (LIGA Process)", Microelectronic Engineering, Vol. 4, p35, 1986
5. D O King, M C L Ward, K M Brunson & D J Hamilton, "Polysilicon Process Development for Fully Integrated Surface Micromachined Accelerometer with CMOS Electronics", Sensors & Actuators, Vol. A68, p238-243, 1998.
6. D O King, M C Ward, A G Cullis, D Gardiner & M Bowden, "Development of a mechanical polysilicon layer for surface machined microelectromechanical systems using TEM, SEM, and Raman spectroscopy", Proc. Microscopy of Semiconducting Materials, Oxford (UK), 1997, IOP Conf. No. 157, p443-446
7. D O King, M E McNie & M C L Ward, "Polysilicon Micromachining and Industry", Proc. Recent Advances in Micromachining Techniques, London (UK), 1997, IEE Digest 97/018, pl/1-1/2
8. M. E. McNie, D. O. King, V Nayar, M. C. L. Ward, J S Burdess, C. Quinn & S. Blackstone, "Deep Dry Etching of SOI for Silicon Micromachined Structures", Proc. IEEE Int. SOI Conference, Yosemite (USA), 1997, Digest No. 97CH36069,p60-61
9. M E McNie & D O King, "CMOS compatibility of High Aspect Ratio Micromachining (HARM) in bonded Silicon-on-Insulator (BSOI)", Int. Micromachining & Microfabrication Symposium, SPIE-3511, Santa Clara (USA), 1998, p277-287
10. R A Noble, R J Bozeat, T J Robertson, D R Billson & D A Hutchins, "Novel Silicon Nitride Micromachined Wide Bandwidth Ultrasonic Transducers", Proc. IEEE Ultrasonics Symposium, Sendai (Japan), 1998, Vol. 2, p1081-1084