Polysilicon process development for fully integrated surface-micromachined accelerometer with CMOS electronics

Sensors and Actuators, A: Physical

Volumn 68, Issue 1-3, 1998, Pages 238-243

  King, David O ^a   Ward, Michael C L ^a   Brunson, Kevin M ^a   Hamilton, David J ^a  

^a DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

Author keywords

Accelerometers; CMOS; Polysilicon; Surface micromachining

Indexed keywords

CMOS INTEGRATED CIRCUITS; CURRENT VOLTAGE CHARACTERISTICS; INTEGRATED CIRCUIT TESTING; MICROMACHINING; POLYSILANES; TRANSMISSION ELECTRON MICROSCOPY;

POLYSILICON; SURFACE MICROMACHINING;

ACCELEROMETERS;

EID: 0042137127     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)01782-2     Document Type: Article

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