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Volumn B, Issue , 2003, Pages 1780-1783

Modified pulsed PECVD technique for nano-crystalline silicon solar cells: An effect of i-layer growth temperature

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLITE SIZE; DUST FORMATION; GROWTH TEMPERATURE; PASSIVATION LAYERS;

EID: 6344278561     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (10)
  • 3
    • 0032673621 scopus 로고    scopus 로고
    • High deposition rate amorphous silicon solar cells and thin film transistors using the pulsed plasma PECVD technique
    • S. Morrison, J. Xi and A. Madan, "High deposition rate amorphous silicon solar cells and thin film transistors using the pulsed plasma PECVD technique", Mat. Res. Soc. Symp. Proc. 507, p. 559 (1998).
    • (1998) Mat. Res. Soc. Symp. Proc. , vol.507 , pp. 559
    • Morrison, S.1    Xi, J.2    Madan, A.3
  • 5
    • 0000969031 scopus 로고
    • Doping effects of oxygen or nitogen impurity in hydrogenated silicon films
    • A. Morimoto, M. Matsumoto, M. Yoshita and M. Kumeda, "Doping effects of oxygen or nitogen impurity in hydrogenated silicon films", Appl. Phys. Lett. 59, 2130 (1991).
    • (1991) Appl. Phys. Lett. , vol.59 , pp. 2130
    • Morimoto, A.1    Matsumoto, M.2    Yoshita, M.3    Kumeda, M.4
  • 7
    • 0035896783 scopus 로고    scopus 로고
    • Passivation of oxygen-related donors in microcrystalline silicon by low temperature deposition
    • Y. Nasuno, M. Kondo, and A. Matsuda, "Passivation of oxygen-related donors in microcrystalline silicon by low temperature deposition", Appl. Phys. Lett. 78, 2330 (2001).
    • (2001) Appl. Phys. Lett. , vol.78 , pp. 2330
    • Nasuno, Y.1    Kondo, M.2    Matsuda, A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.