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Volumn 507, Issue , 1999, Pages 559-564
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High deposition rate amorphous silicon solar cells and thin film transistors using the pulsed plasma PECVD technique
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
FREQUENCY MODULATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
THIN FILM TRANSISTORS;
ACTIVE MATRIX DISPLAYS;
PULSED PLASMA TECHNIQUE;
SILICON SOLAR CELLS;
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EID: 0032673621
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (11)
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References (9)
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