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Volumn 507, Issue , 1999, Pages 559-564

High deposition rate amorphous silicon solar cells and thin film transistors using the pulsed plasma PECVD technique

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; FREQUENCY MODULATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILM TRANSISTORS;

EID: 0032673621     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (11)

References (9)
  • Reference 정보가 존재하지 않습니다.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.