Deposition of amorphous silicon solar cells via the pulsed pecvd technique

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn 2000-January, Issue , 2000, Pages 928-931

  Morrison, Scott ^a   Madan, Arun ^a  

^a MVSystems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION; DEPOSITION RATES; PLASMA CVD; SILICON SOLAR CELLS; SOLAR CELLS;

COMMERCIAL PRODUCTS; DEPOSITION SYSTEMS; GAS UTILIZATION; INITIAL EFFICIENCY; INTRINSIC LAYER; MODULATION FREQUENCIES; SOLAR CELL MODULE; THICKNESS UNIFORMITY;

AMORPHOUS SILICON;

EID: 84949569278     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2000.916036     Document Type: Conference Paper

References (4)

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2. H. Kimura, H. Maeda, H. Murakami, T. Nakahigashi, S. Ohtani, T. Tabata, T. Hayashi, M. Kobayashi, Y. Mitsuda, N. Nakamura, H. Kuwahara, and A. Doi, Jpn. J. Appl. Phys. 33, 1994, p. 4389.
3. S. Morrison and A. Madan, MRS Conference 507, 1998, p. 559.
4. T. J. McMahon and A. Madan, Appl. Phys. Lett. 57, 1985, p. 5302.