Hot-wire CVD thin silicon films on crystalline silicon for solar cell applications

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn B, Issue , 2003, Pages 1225-1228

  Voz, C ^a   Martin, I ^a   Orpella, A ^a   Vetter, M ^a   Puigdollers, J ^a   Alcubilla, R ^a   Soler, D ^b   Fonrodona, M ^b   Bertomeu, J ^b   Andreu, J ^b  

^a UNIVERSITAT POLITÈCNICA DE CATALUNYA   (Spain)

^b UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

COST REDUCTION; CRYSTALLINE SILICON; HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; CURRENT VOLTAGE CHARACTERISTICS; PASSIVATION; SILICON; SURFACE TREATMENT; THIN FILMS;

SOLAR CELLS;

EID: 6344250901     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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