Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 270-273

  Voz, C ^a   Martin, I ^a   Orpella, A ^a   Puigdollers, J ^a   Vetter, M ^a   Alcubilla, R ^a   Soler, D ^b   Fonrodona, M ^b   Bertomeu, J ^b   Andreu, J ^b  

^a UNIVERSITAT POLITÈCNICA DE CATALUNYA   (Spain)

^b UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Catalytic CVD; Heterostructures; Passivation; Solar cells

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRONIC STRUCTURE; NANOSTRUCTURED MATERIALS; PASSIVATION; PHOTOCONDUCTIVITY;

SILICON FILMS;

THIN FILMS;

EID: 0037850775     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00130-5     Document Type: Conference Paper

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