A new, topology driven method for automatic mask generation from three-dimensional models

2003 Nanotechnology Conference and Trade Show - Nanotech 2003

Volumn 1, Issue , 2003, Pages 506-509

  Schiek, R ^a   Schmidt, R ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Automatic mask generation; Geometric modeling; MEMS design; SUMMiT V; Topology

Indexed keywords

ALGORITHMS; AUTOMATION; COMPUTATIONAL GEOMETRY; COMPUTER PROGRAMMING LANGUAGES; MATHEMATICAL MODELS; MICROMACHINING; OPTIMIZATION; REDUNDANCY; TOPOLOGY; TREES (MATHEMATICS);

AUTOMATIC MASK GENERATION; BRANCHING; GEOMETRIC MODELING; MEMS DESIGN; SUMMIT V; SURFACE MICROMACHINING;

MASKS;

EID: 6344248958     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. L. Ma & E. Antonsson, "Automated Mask-Layout and Process Systhesis for MEMS," Modeling and Simulation of Microsystems 2000, pp. 20-23, 2000.
2. L. Ma & E. Antonsson, "Robust Mask-Layout Synthesis for MEMS," Modeling and Simulation of Microsystems 2001, pp. 128-131, 2001.
3. V. Venkataraman, R. Sarma & S. Ananthasuresh, "Part to Art: Basis for a Systematic Geometric Design Tool for Surface Micromachined MEMS" Proceedings of the ASME Design Engineering Technical Conferences 2000, pp. 1-14, 2000.
4. S. Cho, K. Lee & T. Kim, "Development of a geometry-based process planning system for surface micromachining," Int. Journal of Production Research, vol. 40, no. 5, pp. 1275-1293, 2002.
5. C. Jorgensen & V. Yarberry, "A 3D Geometry Modeler for the SUMMiT V MEMS Designer," Modeling and Simulation of Microsystems 2001, pp. 594-597, 2001.