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Volumn , Issue , 2001, Pages 128-131

Robust mask-layout synthesis for MEMS

Author keywords

Genetic algorithm; MEMS; Robust design; Synthesis

Indexed keywords

GENETIC ALGORITHMS; MASKS; OPTIMIZATION; RANDOM PROCESSES; ROBUSTNESS (CONTROL SYSTEMS); SENSITIVITY ANALYSIS;

EID: 6344249472     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (14)

References (8)
  • 1
    • 0000079019 scopus 로고    scopus 로고
    • Alignment of mask patterns to crystal orientation
    • ENSELL, G. Alignment of mask patterns to crystal orientation. Sensors and Actuators A-Physical 53 (1996), 345-348.
    • (1996) Sensors and Actuators A-physical , vol.53 , pp. 345-348
    • Ensell, G.1
  • 2
    • 0033897937 scopus 로고    scopus 로고
    • A genetic algorithm for multiobjective robust design
    • FOROURAGHI, B. A genetic algorithm for multiobjective robust design. Applied Intelligence 12 (2000), 151-161.
    • (2000) Applied Intelligence , vol.12 , pp. 151-161
    • Forouraghi, B.1
  • 6
    • 0003488151 scopus 로고
    • Asian Productivity Organization, Unipub, White Plains, NY
    • TAGUCHI, G. Introduction to Quality Engineering. Asian Productivity Organization, Unipub, White Plains, NY, 1986.
    • (1986) Introduction to Quality Engineering
    • Taguchi, G.1
  • 8
    • 0030156411 scopus 로고    scopus 로고
    • Precise mask alignment to the crystallographic orientation of silicon wafers using wet anisotropic etching
    • VANGBO, M., AND BACKLUND, Y. Precise mask alignment to the crystallographic orientation of silicon wafers using wet anisotropic etching. Journal of Micromechanics and Microengineering 6 (1996), 279-284.
    • (1996) Journal of Micromechanics and Microengineering , vol.6 , pp. 279-284
    • Vangbo, M.1    Backlund, Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.