Plasrna-assisted ALD of Al2O3 at low temperatures: Reaction mechanism and material properties

ECS Transactions

Volumn 16, Issue 4, 2009, Pages 247-255

  Langereis, E ^a   Bouman, M ^a   Keijmel, J ^a   Heil, S B S ^a   Van De Sanden, M C M ^a   Kessels, W M M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE;

GROWTH PER CYCLE; IMPURITY CONTENT; LOW TEMPERATURES; OH SURFACE GROUPS; PLASMA EXPOSURE; REACTION MECHANISM; SITU DIAGNOSTICS; SUBSTRATE TEMPERATURE;

ATOMIC LAYER DEPOSITION;

EID: 63149129661     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2980000     Document Type: Conference Paper

References (14)

1. S. D. Elliot and J. C. Greer, J. Mater. Chem. 14, 3246 (2004).
2. S. D. Elliot, G. Scarel, C. Wiemer, M. Fanciulli, and G. Pavia, Chem. Mater. 18, 3764 (2006).
3. S.-C. Ha, E. Choi, S.-H. Kim, and J. S. Roh, Thin Solid Films 476, 252 (2005).
4. J. Kwon, M. Dai, M. D. Halls, and Y. J. Chabal, Chem. Mater. 20, 3248 (2008).
5. S. B. S. Heil, P. Kudlacek, E. Langereis, R. Engeln, M. C. M. van de Sanden, and W. M. M. Kessels, Appl. Phys. Lett. 89, 131505 (2006).
6. E. Langereis, M. Creatore, S. B. S. Heil, M. C. M. van de Sanden, and W. M. M. Kessels, Appl. Phys. Lett. 89, 081915 (2006).
7. J. L. van Hemmen, S. B. S. Heil, J. H. Klootwijk, F. Roozeboom, C. J. Hodson, M. C. M. van de Sanden, and W. M. M. Kessels. J. Electrochem. Soc. 154, G165 (2007).
8. S. B. S. Heil, J. L. van Hemmen, M. C. M. van de Sanden, and W. M. M. Kessels, J. Appl. Phys. 103, 103302 (2008).
9. E. Langereis, J. Keijmel, M. C. M. van de Sanden, and W. M. M. Kessels, Appl. Phys. Lett. 92, 231904 (2008).
10. A. C. Dillon, A. W. Ott, J. D. Way, and S. M. George, Surf. Sci. 322, 230 (1995).
11. S. M. George, A. W. Ott, and J. W. Klaus, J. Phys. Chem. 100, 13121 (1996).
12. M. M. Frank, Y. J. Chabal, and G. D. Wilk, Appl. Phys. Lett. 82, 4758 (2003).
13. M. D. Halls, K. Raghavachari, M. M. Frank, and Y. J. Chabal, Phys. Rev. B 68, 161302(2003).
14. A. Rahtu, T. Alaranta, and M. Ritala, Langmuir 17, 6506 (2001).