Deposition of ZnO thin films on SiO2/Si substrate with Al2O3 buffer layer by radio frequency magnetron sputtering for high frequency surface acoustic wave devices

Thin Solid Films

Volumn 517, Issue 11, 2009, Pages 3378-3381

  Shih, Wen Ching ^a   Su, Hong Yi ^a   Wu, Mu Shiang ^a  

^a TATUNG UNIVERSITY   (Taiwan)

Author keywords

Aluminum oxide; Piezoelectric effect; Sputtering; Zinc oxide

Indexed keywords

ACOUSTIC SURFACE WAVE DEVICES; ACOUSTIC WAVES; ACOUSTICS; ACOUSTOELECTRIC EFFECTS; ALUMINA; ALUMINUM; ATOMIC FORCE MICROSCOPY; BUFFER LAYERS; CORUNDUM; CRYSTAL ATOMIC STRUCTURE; MAGNETRONS; METALLIC FILMS; PIEZOELECTRIC TRANSDUCERS; PIEZOELECTRICITY; RADIO; RADIO WAVES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR DEVICES; SILICON; SILICON COMPOUNDS; ZINC; ZINC OXIDE;

ALUMINUM OXIDE; ATOMIC FORCES; CENTER FREQUENCIES; CRYSTALLINE STRUCTURES; HIGH FREQUENCIES; HIGH-FREQUENCY SURFACES; PIEZOELECTRIC EFFECT; RADIO FREQUENCY MAGNETRON SPUTTERING; SAPPHIRE SUBSTRATES; SAW DEVICES; SI SUBSTRATES; SURFACE ACOUSTIC WAVE DEVICES; X- RAY DIFFRACTIONS; ZNO FILMS; ZNO THIN FILMS;

SUBSTRATES;

EID: 62849124277     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.12.008     Document Type: Article

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