Mask pattern correction by energy loss compensation in extreme ultraviolet lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5467-5473

  Sugawara, Minoru ^a   Nishiyama, Iwao ^a   Takai, Mikio ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Energy loss compensation; Extreme ultraviolet lithography; Mask pattern correction; Off axis incidence; Pattern fidelity

Indexed keywords

ENERGY DISSIPATION; MASKS; OPTICAL PROPERTIES; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; MASK PATTERN CORRECTION; OFF-AXIS INCIDENCE; PATTERN FIDELITY;

LITHOGRAPHY;

EID: 24644443591     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5467     Document Type: Article

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