Printability verification for double-patterning technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Luk Pat, Gerard ^a   Panaite, Petrisor ^a   Lucas, Kevin ^a   Cork, Christopher ^b   Wiaux, Vincent ^c   Verhaegen, Staf ^c   Maenhoudt, Mireille ^c  

^a SYNOPSYS INC   (United States)

^b Synopsys SARL   (France)

^c IMEC   (Belgium)

Author keywords

Double patterning; DPT; Dual patterning; Etch; LRC; Overlay; Printability verification

Indexed keywords

DOUBLE PATTERNING; DPT; DUAL PATTERNING; ETCH; LRC; OVERLAY; PRINTABILITY VERIFICATION;

INTEGRATED CIRCUITS; LAWS AND LEGISLATION; TECHNOLOGY; TITRATION;

LITHOGRAPHY;

EID: 62649137533     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801545     Document Type: Conference Paper

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