-
1
-
-
33846587516
-
Manufacturing of the first EUV full field scanner mask
-
U. Dersch, R. Buettner, C. Chovino, S. Franz, T. Heins, H. Herguth, J. H. Peters, T. Rode, F. Letzkus, J. Butschke, and M. Irmscher, "Manufacturing of the first EUV full field scanner mask", Proc. SPIE, Vol 6349, (2006).
-
(2006)
Proc. SPIE
, vol.6349
-
-
Dersch, U.1
Buettner, R.2
Chovino, C.3
Franz, S.4
Heins, T.5
Herguth, H.6
Peters, J.H.7
Rode, T.8
Letzkus, F.9
Butschke, J.10
Irmscher, M.11
-
2
-
-
24644498099
-
Development of the ASML EUV alpha demo tool
-
H. Meiling, V. Banine, N. Harned, B. Blum, P. Kürz, and H.Meijer, "Development of the ASML EUV alpha demo tool", Proc. SPIE, Vol. 5751, (2005).
-
(2005)
Proc. SPIE
, vol.5751
-
-
Meiling, H.1
Banine, V.2
Harned, N.3
Blum, B.4
Kürz, P.5
Meijer, H.6
-
3
-
-
33745628745
-
First performance results of the ASML alpha demo tools
-
H. Meiling, H.Meijer, V.Banine, R.Moors, R.Groeneveld, H.J.Voorma, U.Mickan, B.Wolschrijn, B.Mertens, G.vanBaars, P. Kürz, and N.Harned, "First performance results of the ASML alpha demo tools", Proc. SPIE, Vol. 6151,(2006).
-
(2006)
Proc. SPIE
, vol.6151
-
-
Meiling, H.1
Meijer, H.2
Banine, V.3
Moors, R.4
Groeneveld, R.5
Voorma, H.J.6
Mickan, U.7
Wolschrijn, B.8
Mertens, B.9
vanBaars, G.10
Kürz, P.11
Harned, N.12
-
4
-
-
35148888641
-
EUV lithography with the Alpha Demo Tools: Status and challenges
-
N. Harned, M. Goethals, R. Groeneveld, P. Kuerz, M, Lowisch, H. Meijer, H. Meiling, K. Ronse, J. Ryan, M. Tittnieh, H. Voorma, J. Zimmerman, U. Mickan, and S. Lok, "EUV lithography with the Alpha Demo Tools: status and challenges", Proc. SPIE, Vol 6517, (2007).
-
(2007)
Proc. SPIE
, vol.6517
-
-
Harned, N.1
Goethals, M.2
Groeneveld, R.3
Kuerz, P.4
Lowisch, M.5
Meijer, H.6
Meiling, H.7
Ronse, K.8
Ryan, J.9
Tittnieh, M.10
Voorma, H.11
Zimmerman, J.12
Mickan, U.13
Lok, S.14
-
5
-
-
33745619208
-
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
-
P. N. Naulleau, C. Rammeloo, J. P. Cain, K. Dean, P. E. Denham, K. A. Goldberg, B. Hoef, B. La Fontaine, A. R. Pawloski, C. Larson, and G. Wallraff, "Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists", Proc. SPIE, Vol 6151, (2006).
-
(2006)
Proc. SPIE
, vol.6151
-
-
Naulleau, P.N.1
Rammeloo, C.2
Cain, J.P.3
Dean, K.4
Denham, P.E.5
Goldberg, K.A.6
Hoef, B.7
La Fontaine, B.8
Pawloski, A.R.9
Larson, C.10
Wallraff, G.11
-
6
-
-
79959357002
-
-
B, La Fontaine, Y, Deng, R. Kim, H. Levinson, S. McGowan, U. Okoroanyanwu, R. Seltmann, C. Tabery, A. Tchikoulaeva, T, Wallow, O. Wood, J. Arnold, D. Canaperi, M. Colburn, K. Kimmel, C. Koay, E, Mclellan, D. Medeiros, S. Rao, K. Petrillo, Y. Yin, H. Mizuno, S. Bouten, M. Crouse, A. Dijk, Y, Dommelen, J, Galloway, S. Han, B. Kessels, B. Lee, S. Lok, B. Niekrewicz, B. Pierson, R. Routh, E. Schmit-Weaver, K. Cummings, and J. Word, The Use of EUV Lithography to Produce Demonstration Devices, Proc SPIE, 6921, (2008).
-
B, La Fontaine, Y, Deng, R. Kim, H. Levinson, S. McGowan, U. Okoroanyanwu, R. Seltmann, C. Tabery, A. Tchikoulaeva, T, Wallow, O. Wood, J. Arnold, D. Canaperi, M. Colburn, K. Kimmel, C. Koay, E, Mclellan, D. Medeiros, S. Rao, K. Petrillo, Y. Yin, H. Mizuno, S. Bouten, M. Crouse, A. Dijk, Y, Dommelen, J, Galloway, S. Han, B. Kessels, B. Lee, S. Lok, B. Niekrewicz, B. Pierson, R. Routh, E. Schmit-Weaver, K. Cummings, and J. Word, "The Use of EUV Lithography to Produce Demonstration Devices", Proc SPIE, Vol 6921, (2008).
-
-
-
-
7
-
-
35148816568
-
Chemically Amplified Resists Resolving 25 nm 1:1 Line:Space Features with EUV Lithography
-
J. Thackeray, R. Nassar, R. Brainard, D. Goldfarb, T. Wallow, Y. Wei, J. Mackey, P. Naulleau, B. Pierson, H. Solak, "Chemically Amplified Resists Resolving 25 nm 1:1 Line:Space Features with EUV Lithography", Proc SPIE, Vol 6517, (2007).
-
(2007)
Proc SPIE
, vol.6517
-
-
Thackeray, J.1
Nassar, R.2
Brainard, R.3
Goldfarb, D.4
Wallow, T.5
Wei, Y.6
Mackey, J.7
Naulleau, P.8
Pierson, B.9
Solak, H.10
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