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Volumn 7122, Issue , 2008, Pages

An investigation of EUV lithography defectivity

Author keywords

EUV defects; Euv lithography; EUV masks; EUV resists; EUVL; Extreme ultraviolet lithography

Indexed keywords

EUV DEFECTS; EUV LITHOGRAPHY; EUV MASKS; EUV RESISTS; EUVL;

EID: 62649131549     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801528     Document Type: Conference Paper
Times cited : (10)

References (7)
  • 6
    • 79959357002 scopus 로고    scopus 로고
    • B, La Fontaine, Y, Deng, R. Kim, H. Levinson, S. McGowan, U. Okoroanyanwu, R. Seltmann, C. Tabery, A. Tchikoulaeva, T, Wallow, O. Wood, J. Arnold, D. Canaperi, M. Colburn, K. Kimmel, C. Koay, E, Mclellan, D. Medeiros, S. Rao, K. Petrillo, Y. Yin, H. Mizuno, S. Bouten, M. Crouse, A. Dijk, Y, Dommelen, J, Galloway, S. Han, B. Kessels, B. Lee, S. Lok, B. Niekrewicz, B. Pierson, R. Routh, E. Schmit-Weaver, K. Cummings, and J. Word, The Use of EUV Lithography to Produce Demonstration Devices, Proc SPIE, 6921, (2008).
    • B, La Fontaine, Y, Deng, R. Kim, H. Levinson, S. McGowan, U. Okoroanyanwu, R. Seltmann, C. Tabery, A. Tchikoulaeva, T, Wallow, O. Wood, J. Arnold, D. Canaperi, M. Colburn, K. Kimmel, C. Koay, E, Mclellan, D. Medeiros, S. Rao, K. Petrillo, Y. Yin, H. Mizuno, S. Bouten, M. Crouse, A. Dijk, Y, Dommelen, J, Galloway, S. Han, B. Kessels, B. Lee, S. Lok, B. Niekrewicz, B. Pierson, R. Routh, E. Schmit-Weaver, K. Cummings, and J. Word, "The Use of EUV Lithography to Produce Demonstration Devices", Proc SPIE, Vol 6921, (2008).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.