Direct and dry micro-patterning of nano-particles by electrospray deposition through a micro-stencil mask

Journal of Micromechanics and Microengineering

Volumn 19, Issue 2, 2009, Pages

  Kim, J W ^a,d   Yamagata, Y ^b   Kim, B J ^c   Higuchi, T ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b RIKEN   (Japan)

^c INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

^d TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON COMPOUNDS; SILICON NITRIDE; SUPRAMOLECULAR CHEMISTRY; SURFACE ROUGHNESS;

APERTURE SIZES; BIO-MACROMOLECULES; COEFFICIENT OF VARIATION VALUES; ELECTRICAL INSULATIONS; ELECTROSPRAY DEPOSITIONS; FOCUSING EFFECTS; HIGHEST RESOLUTIONS; LATEX BEADS; M-LINES; MICRO PATTERNS; MICRO-PATTERNING; NANO STRUCTURES; NANO-PARTICLES; NANOMETER RESOLUTIONS; SILICON NITRIDE MEMBRANES; SIZE UNIFORMITIES; STENCIL MASKS; THICKNESS UNIFORMITIES;

ELECTRODEPOSITION;

EID: 61849094303     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/2/025021     Document Type: Article

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