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Volumn 113, Issue 6, 2009, Pages 1026-1032

Room temperature instability of E′γ, centers induced by γ irradiation in amorphous SiO2

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ANNEALING; DEFECTS; GROWTH KINETICS; PULSED LASER APPLICATIONS; RADIATION; SILICA; WATER ANALYSIS;

EID: 61649096209     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp8054813     Document Type: Article
Times cited : (9)

References (53)
  • 1
    • 0003641685 scopus 로고    scopus 로고
    • Pacchioni, G, Skuja, L, Griscom, D. L, Eds, Kluwer Academic Publishers: Hingham, MA
    • 2 and Related Dielectrics: Science and Technology; Kluwer Academic Publishers: Hingham, MA, 2000.
    • (2000) 2 and Related Dielectrics: Science and Technology
  • 2
    • 0142119939 scopus 로고    scopus 로고
    • Nalwa, H. S, Ed, Academic Press: New York
    • Nalwa, H. S., Ed. Silicon-Based Materials and Devices; Academic Press: New York, 2001.
    • (2001) Silicon-Based Materials and Devices
  • 25
    • 12044259758 scopus 로고    scopus 로고
    • Griscom, D. L.; Gingerich, M. E.; J.; Friebele, E. Phys. Rev. Lett. 1993, 71, 1019.
    • Griscom, D. L.; Gingerich, M. E.; J.; Friebele, E. Phys. Rev. Lett. 1993, 71, 1019.
  • 33
    • 61649095620 scopus 로고    scopus 로고
    • Heraeus Quarzglas GmbH, Private communication
    • Kühn, B. (Heraeus Quarzglas GmbH). Private communication.
    • Kühn, B.1
  • 40
    • 61649114651 scopus 로고    scopus 로고
    • t0; i.e., the initial concentration of hydrogen is insufficient to completely passivate the defects.
    • t0; i.e., the initial concentration of hydrogen is insufficient to completely passivate the defects.
  • 44
    • 61649090428 scopus 로고    scopus 로고
    • 3,15,43
    • 3,15,43
  • 47
    • 61649124019 scopus 로고    scopus 로고
    • eff is lost.
    • eff is lost.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.