Water diffusion into silica glass at a low temperature under high water vapor pressure

Journal of Non-Crystalline Solids

Volumn 347, Issue 1-3, 2004, Pages 211-219

  Oehler, Andrea ^a,b   Tomozawa, Minoru ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FICK'S LAW; REACTION EQUILIBRIUM; SILICA GLASSES; WATER DIFFUSION;

CHEMICAL VAPOR DEPOSITION; DIFFUSION; ETCHING; HYDRATION; INFRARED SPECTROSCOPY; LOW TEMPERATURE EFFECTS; MICROELECTROMECHANICAL DEVICES; POROUS MATERIALS; REACTION KINETICS; SILICA; SOLUBILITY; SPECTROPHOTOMETERS; WATER;

GLASS;

EID: 9544252201     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.07.013     Document Type: Article

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