Growth modes in metal-organic molecular beam epitaxy of TiO2 on r -plane sapphire

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 2, 2009, Pages 230-233

  Jalan, Bharat ^a   Engel Herbert, Roman ^a   Cagnon, Jol ^a   Stemmer, Susanne ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCES; FLOW MODES; GROWTH MODES; INITIAL STAGES; LAYER-BY-LAYER GROWTHS; METAL-ORGANIC MOLECULAR BEAM EPITAXIES; OXYGEN PLASMAS; PLANE SAPPHIRES; REFLECTION HIGH-ENERGY ELECTRON DIFFRACTIONS; RF PLASMA SOURCES; RUTILE TIO2; SAPPHIRE SUBSTRATES; SUBSTRATE TEMPERATURES; TITANIUM TETRAISOPROPOXIDE; X-RAY REFLECTIVITIES;

CORUNDUM; EPITAXIAL FILMS; EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MOLECULAR DYNAMICS; OXIDE MINERALS; OXYGEN; PLASMAS; SAPPHIRE; SEMICONDUCTOR QUANTUM WIRES; SUBSTRATES; TITANIUM; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY;

FILM GROWTH;

EID: 61449158774     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3065713     Document Type: Article

References (18)

1. D. C. Cronemeyer, Phys. Rev. 113, 1222 (1959).
2. A. L. Linsebigler, G. Q. Lu, and J. T. Yates, Chem. Rev. (Washington, D.C.) 95, 735 (1995).
3. S. A. Campbell, D. C. Gilmer, X. C. Wang, M. T. Hsieh, H. S. Kim, W. L. Gladfelter, and J. H. Yan, IEEE Trans. Electron Devices 0018-9383 10.1109/16.554800 44, 104 (1997).
4. Y. Matsumoto, M. Murakami, T. Shono, T. Hasegawa, T. Fukumura, M. Kawasaki, P. Ahmet, T. Chikyow, S. Koshihara, and H. Koinuma, Science 0036-8075 10.1126/science.1056186 291, 854 (2001).
5. A. -B. Posadas, M. Lippmaa, F. J. Walker, M. Dawber, C. H. Ahn, and J. -M. Triscone, in Physics of Ferroelectrics: A Modern Perspective, edited by, K. M. Rabe, C. H. Ahn, and, J. -M. Triscone, (Springer, Berlin, 2007), p. 219.
6. C. D. Theis and D. G. Schlom, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.580185 14, 2677 (1996).
7. S. A. Chambers, Surf. Sci. Rep. 0167-5729 10.1016/S0167-5729(00)00005-4 39, 105 (2000).
8. C. J. Taylor, D. C. Gilmer, D. G. Colombo, G. D. Wilk, S. A. Campbell, J. Roberts, and W. L. Gladfelter, J. Am. Chem. Soc. 0002-7863 10.1021/ja984446f 121, 5220 (1999).
9. P. W. Chu, Ph.D. thesis, Cornell University, 1994.
10. K. H. Ahn, Y. B. Park, and D. W. Park, Surf. Coat. Technol. 0257-8972 10.1016/S0257-8972(03)00271-8 171, 198 (2002).
11. S. Chen, M. G. Mason, H. J. Gysling, G. R. Pazpujalt, T. N. Blanton, T. Castro, K. M. Chen, C. P. Fictorie, W. L. Gladfelter, A. Franciosi, P. I. Cohen, and J. F. Evans, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.578587 11, 2419 (1993).
12. K. L. Siefering and G. L. Griffin, J. Electrochem. Soc. 0013-4651 10.1149/1.2086632 137, 1206 (1990).
13. P. D. Desai, Int. J. Thermophys. 0195-928X 10.1007/BF00500794 8, 781 (1987).
14. D. Andeen and F. F. Lange, Int. J. Mater. Res. 98, 1222 (2007).
15. M. Yoshimoto, T. Maeda, T. Ohnishi, H. Koinuma, O. Ishiyama, M. Shinohara, M. Kubo, R. Miura, and A. Miyamoto, Appl. Phys. Lett. 0003-6951 10.1063/1.114313 67, 2615 (1995).
16. M. Yokozawa, H. Iwasa, and I. Teramoto, Jpn. J. Appl. Phys., Part 1 7, 96 (1968). 0021-4922
17. R. Engel-Herbert, J. Cagnon, B. Jalan, and S. Stemmer (unpublished).
18. J. Y. Huang, B. H. Park, D. Jan, X. Q. Pan, Y. T. Zhu, and Q. X. Jia, Philos. Mag. A 0141-8610 10.1080/01418610110087291 82, 735 (2002).