SCOPUS 정보 검색 플랫폼

Volumn 105, Issue , 2007, Pages 219-304

Growth and novel applications of epitaxial oxide thin films

Author keywords

[No Author keywords available]

Indexed keywords

EID: 34547574095 PISSN: 03034216 EISSN: 14370859 Source Type: Book Series
DOI: 10.1007/978-3-540-34591-6_6 Document Type: Article

Times cited : (30)

References (12)

1
- 36449005326
- Compact substrate heater for use in an oxidizing environment
- T. E. Jones, W. C. McGinnis, J. S. Briggs: Compact substrate heater for use in an oxidizing environment, Rev. Sci. Instrum. 65, 977 (1994) 223
- (1994) Rev. Sci. Instrum , vol.65 , Issue.977 , pp. 223
- Jones, T.E.¹ McGinnis, W.C.² Briggs, J.S.³

2
- 29744467962
- A. Schmehl, R. R. Schulz, J. Mannhart: Eucentric four-axis ultrahigh vacuum goniometer for reflection high-energy electron diffraction applications, Rev. Sci. Instrum. 76, 123901 (2005) 223
- A. Schmehl, R. R. Schulz, J. Mannhart: Eucentric four-axis ultrahigh vacuum goniometer for reflection high-energy electron diffraction applications, Rev. Sci. Instrum. 76, 123901 (2005) 223

3
- 34547595696
- Oxidation of molybdenum chromium palladium alloys
- D. B. Lee, G. Simkovich: Oxidation of molybdenum chromium palladium alloys, Oxid. Met. 31, 265 (1989) 223
- (1989) Oxid. Met , vol.31 , Issue.265 , pp. 223
- Lee, D.B.¹ Simkovich, G.²

4
- 34547599466
- Volatization of oxides during oxidation of some superalloys at 1200 degrees C
- I. Zaplatynsky: Volatization of oxides during oxidation of some superalloys at 1200 degrees C, Oxid. Met. 11, 289 (1977) 223
- (1977) Oxid. Met , vol.11 , Issue.289 , pp. 223
- Zaplatynsky, I.¹

5
- 0015033681
- Some limiting factors in use of alloys at high temperatures
- G. R. Wallwork, A. Z. Hed: Some limiting factors in use of alloys at high temperatures, Oxid. Met. 3, 171 (1971) 223
- (1971) Oxid. Met , vol.3 , Issue.171 , pp. 223
- Wallwork, G.R.¹ Hed, A.Z.²

6
- 0009254780
- An oxygen-compatible radiant substrate heater for thin film growth at substrate temperatures up to 1050 degrees C
- J. C. Clark, J. P. Maria, K. J. Hubbard, D. G. Schlom: An oxygen-compatible radiant substrate heater for thin film growth at substrate temperatures up to 1050 degrees C, Rev. Sci. Instrum. 68, 2538 (1997) 223
- (1997) Rev. Sci. Instrum , vol.68 , Issue.2538 , pp. 223
- Clark, J.C.¹ Maria, J.P.² Hubbard, K.J.³ Schlom, D.G.⁴

7
- 34547567042
- A versatile substrate heater for use in highly oxidizing atmospheres
- R. C. Estler, N. S. Nogar, R. E. Muenchausen, X. D. Wu, S. Foltyn, A. R. Garcia: A versatile substrate heater for use in highly oxidizing atmospheres, Rev. Sci. Instrum. 62, 437 (1991) 223
- (1991) Rev. Sci. Instrum , vol.62 , Issue.437 , pp. 223
- Estler, R.C.¹ Nogar, N.S.² Muenchausen, R.E.³ Wu, X.D.⁴ Foltyn, S.⁵ Garcia, A.R.⁶

8
- 0039417641
- x films growth without electrical feedthroughs
- x films growth without electrical feedthroughs, Physica C 235-240, 641 (1994) 224
- (1994) Physica C , vol.235-240 , Issue.641 , pp. 224
- Vase, P.¹ Shen, Y.Q.² Holst, T.³ Hagensen, M.⁴ Freltoft, T.⁵

9
- 0035420099
- Pulsed laser deposition system for producing oxide thin films at high temperature
- M. Orita, H. Ohta, H.Hiramatsu, M. Hirano, S. Den, M. Sasaki, T. Katagiri, H. Mimura, H. Hosono: Pulsed laser deposition system for producing oxide thin films at high temperature, Rev. Sci. Instrum. 72, 3340 (2001) 224
- (2001) Rev. Sci. Instrum , vol.72 , Issue.3340 , pp. 224
- Orita, M.¹ Ohta, H.² Hiramatsu, H.³ Hirano, M.⁴ Den, S.⁵ Sasaki, M.⁶ Katagiri, T.⁷ Mimura, H.⁸ Hosono, H.⁹

10
- 0039442621
- 2-laser heated substrates
- 2-laser heated substrates, Appl. Phys. Lett. 58, 1089 (1991) 224
- (1991) Appl. Phys. Lett , vol.58 , Issue.1089 , pp. 224
- Wu, K.H.¹ Lee, C.L.² Juang, J.Y.³ Uen, T.M.⁴ Gou, Y.S.⁵

11
- 34547576871
- Compact laser molecular beam epitaxy system using laser heating of substrate for oxide film growth
- S. Ohashi, M. Lippmaa, N. Nakagawa, H. Nagasawa, H. Koinuma, M. Kawasaki: Compact laser molecular beam epitaxy system using laser heating of substrate for oxide film growth, Rev. Sci. Instrum. 70, 178 (1999) 224
- (1999) Rev. Sci. Instrum , vol.70 , Issue.178 , pp. 224
- Ohashi, S.¹ Lippmaa, M.² Nakagawa, N.³ Nagasawa, H.⁴ Koinuma, H.⁵ Kawasaki, M.⁶

12
- 0040752986
- High-temperature goniometer for thin film growth and ion scattering studies
- M. Lippmaa, T. Furumochi, S. Ohashi, M. Kawasaki, H. Koinuma, T. Satoh, T. Ishida, H. Nagasawa: High-temperature goniometer for thin film growth and ion scattering studies, Rev. Sci. Instrum. 72, 1755 (2001) 224
- (2001) Rev. Sci. Instrum , vol.72 , Issue.1755 , pp. 224
- Lippmaa, M.¹ Furumochi, T.² Ohashi, S.³ Kawasaki, M.⁴ Koinuma, H.⁵ Satoh, T.⁶ Ishida, T.⁷ Nagasawa, H.⁸

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.