Suppressor effects during copper superfilling of sub-100 nm lines

Electrochemical and Solid-State Letters

Volumn 12, Issue 4, 2009, Pages

  Huang, Q ^a   Baker O'Neal, B C ^a   Kelly, J J ^a   Broekmann, P ^b,c   Wirth, A ^b   Emnet, C ^b   Martin, M ^b   Hahn, M ^b   Wagner, A ^b   Mayer, D ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b BASF SE   (Germany)

^c UNIVERSITY OF BERN   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

TRANSIENTS;

COPPER SUPERFILLING; GALVANOSTATIC; POTENTIAL TRANSIENTS; SUB-100 NM; SUPERFILLING;

COPPER;

EID: 60449116497     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3078074     Document Type: Article

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