SCOPUS 정보 검색 플랫폼

Electrochemical and Solid-State Letters

Volumn 12, Issue 4, 2009, Pages

Effect of organosilane underlayers on the effectiveness of NiB barrier layers in ULSI metallization

(5) Yoshino, Masahiro a Aramaki, Hitoshi a Matsuda, Itsuaki a Okinaka, Yutaka a Osaka, Tetsuya a

a WASEDA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; COPPER DEPOSITS; PALLADIUM; SILICON COMPOUNDS; ULSI CIRCUITS;

3-AMINOPROPYLTRIETHOXYSILANE; BARRIER LAYERS; BARRIER PROPERTIES; ELECTROLESS DEPOSITIONS; METALLIZATION; ORGANOSILANE; ORGANOSILANE MONOLAYERS; ULTRA LARGE SCALE INTEGRATIONS; UNDERLAYER; UNDERLAYERS;

SILANES;

EID: 60449089701 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.3072778 Document Type: Article

Times cited : (7)

References (12)

1
- 0032166781
- P. C. Andricacos, C. Uzoh, J. O. Dukovic, J. Horkans, and H. Deligianni, IBM J. Res. Dev., 42, 567 (1998).
- (1998) IBM J. Res. Dev. , vol.42 , pp. 567
- Andricacos, P.C.¹ Uzoh, C.² Dukovic, J.O.³ Horkans, J.⁴ Deligianni, H.⁵

2
- 0033097801
- P. C. Andricacos, Electrochem. Soc. Interface, 8 (1), 32 (1999).
- (1999) Electrochem. Soc. Interface , vol.8 , Issue.1 , pp. 32
- Andricacos, P.C.¹

3
- 0030214895
- T. Oku, E. Kawakami, M. Uekubo, K. Takahiro, S. Yamaguchi, and M. Murakami, Appl. Surf. Sci., 99, 265 (1996).
- (1996) Appl. Surf. Sci. , vol.99 , pp. 265
- Oku, T.¹ Kawakami, E.² Uekubo, M.³ Takahiro, K.⁴ Yamaguchi, S.⁵ Murakami, M.⁶

4
- 0001294471
- M. H. Tsai, S. C. Sun, C. E. Tsai, S. H. Chuang, and H. T. Chiu, J. Appl. Phys., 79, 6932 (1996).
- (1996) J. Appl. Phys. , vol.79 , pp. 6932
- Tsai, M.H.¹ Sun, S.C.² Tsai, C.E.³ Chuang, S.H.⁴ Chiu, H.T.⁵

5
- 22944447452
- H. Kim, C. Detavenier, O. S. M. Van der Straten, S. M. Rossnagel, and A. J. Kellock, J. Appl. Phys., 98, 014308 (2005).
- (2005) J. Appl. Phys. , vol.98 , pp. 014308
- Kim, H.¹ Detavenier, C.² Van Der Straten, O.S.M.³ Rossnagel, S.M.⁴ Kellock, A.J.⁵

6
- 27644438381
- M. Yoshino, Y. Nonaka, J. Sasano, I. Matsuda, Y. Shacham-Diamand, and T. Osaka, Electrochim. Acta, 51, 916 (2005).
- (2005) Electrochim. Acta , vol.51 , pp. 916
- Yoshino, M.¹ Nonaka, Y.² Sasano, J.³ Matsuda, I.⁴ Shacham-Diamand, Y.⁵ Osaka, T.⁶

7
- 35148821894
- T. Osaka and M. Yoshino, Electrochim. Acta, 53, 271 (2007).
- (2007) Electrochim. Acta , vol.53 , pp. 271
- Osaka, T.¹ Yoshino, M.²

8
- 33846965995
- M. Yoshino, T. Masuda, T. Yokoshima, J. Sasano, Y. Shacham-Diamand, I. Matsuda, T. Osaka, Y. Hagiwara, and I. Sato, J. Electrochem. Soc., 154, D122 (2007).
- (2007) J. Electrochem. Soc. , vol.154 , pp. 122
- Yoshino, M.¹ Masuda, T.² Yokoshima, T.³ Sasano, J.⁴ Shacham-Diamand, Y.⁵ Matsuda, I.⁶ Osaka, T.⁷ Hagiwara, Y.⁸ Sato, I.⁹

9
- 1842425564
- F. Zhang and M. P. Srinivasan, Langmuir, 20, 2309 (2004).
- (2004) Langmuir , vol.20 , pp. 2309
- Zhang, F.¹ Srinivasan, M.P.²

10
- 0030288131
- D. Kowalczyk, S. Slomkowski, M. M. Chehimi, and M. Delamar, Int. J. Adhes. Adhes., 16, 227 (1993).
- (1993) Int. J. Adhes. Adhes. , vol.16 , pp. 227
- Kowalczyk, D.¹ Slomkowski, S.² Chehimi, M.M.³ Delamar, M.⁴

11
- 0037666297
- K. Maex, M. R. Baklanov, D. Shamiryan, F. Lacopi, S. H. Brongersma, and Z. S. Yanovitskaya, J. Appl. Phys., 93, 8793 (2003).
- (2003) J. Appl. Phys. , vol.93 , pp. 8793
- Maex, K.¹ Baklanov, M.R.² Shamiryan, D.³ Lacopi, F.⁴ Brongersma, S.H.⁵ Yanovitskaya, Z.S.⁶

12
- 34249805992
- M. Hasegawa, N. Yamachika, Y. Okinaka, Y. Shacham-Diamand, and T. Osaka, Electrochemistry (Tokyo, Jpn.), 75, 349 (2007).
- (2007) Electrochemistry (Tokyo, Jpn.) , vol.75 , pp. 349
- Hasegawa, M.¹ Yamachika, N.² Okinaka, Y.³ Shacham-Diamand, Y.⁴ Osaka, T.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.