Fabrication and characterization of NiO/ZnO p-n junctions by pulsed laser deposition

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 41, Issue 4, 2009, Pages 617-620

  Gupta, R K ^a   Ghosh, K ^a   Kahol, P K ^a  

^a MISSOURI STATE UNIVERSITY   (United States)

Author keywords

NiO; p n junction; Pulsed laser; Semiconductor; Thin films; ZnO

Indexed keywords

ATOMIC SPECTROSCOPY; CONDUCTIVE FILMS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CONDUCTIVITY; LASERS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR LASERS; SEMICONDUCTOR MATERIALS; SURFACE ROUGHNESS; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

NIO; P-N JUNCTION; PULSED LASER; SEMICONDUCTOR; ZNO;

SEMICONDUCTOR JUNCTIONS;

EID: 60349103341     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2008.10.013     Document Type: Article

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