Fabrication and simulation of a gated thin film emitter

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 700-704

  Ko, Tae Young ^a   Chung, Bokeon ^a   Lee, J Y ^a   Jeon, D ^a  

^a Myong Ji University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRODES; ELECTRON EMISSION; ETCHING; LEAKAGE CURRENTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; TRIODES;

DIAMOND LIKE CARBON FILM; ION BEAM SPUTTERING; THIN FILM EMITTER;

THIN FILM DEVICES;

EID: 0032027628     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589885     Document Type: Article

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