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Volumn 311, Issue 3, 2009, Pages 504-507
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Mass production and characterization of free-standing ZnO nanotripods by thermal chemical vapor deposition
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Author keywords
A3. Chemical vapor deposition processes; B1. Nanomaterials; B2. Semiconducting II VI materials
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Indexed keywords
DEFECT DENSITY;
NANOSTRUCTURED MATERIALS;
SEMICONDUCTING ZINC COMPOUNDS;
SULFUR COMPOUNDS;
VAPORS;
VEGETATION;
ZINC;
ZINC OXIDE;
A3. CHEMICAL VAPOR DEPOSITION PROCESSES;
B1. NANOMATERIALS;
B2. SEMICONDUCTING II-VI MATERIALS;
DEEP-LEVEL EMISSIONS;
HEXAGONAL STRUCTURES;
LOW DEFECT DENSITIES;
MASS PRODUCTIONS;
NEAR BAND-EDGE EMISSIONS;
OPTICAL QUALITIES;
ROOM-TEMPERATURE PHOTOLUMINESCENCES;
SINGLE-CRYSTALLINE;
THERMAL CHEMICAL VAPOR DEPOSITIONS;
TWIN BOUNDARIES;
TWIN STRUCTURES;
ZINC BLENDES;
ZNO;
CHEMICAL VAPOR DEPOSITION;
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EID: 59749086076
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2008.09.057 Document Type: Article |
Times cited : (13)
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References (23)
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