ZnO nanoneedles grown vertically on Si substrates by non-catalytic vapor-phase epitaxy

Advanced Materials

Volumn 14, Issue 24, 2002, Pages 1841-1843

  Park, Won Il ^a   Yi, Gyu Chul ^a   Kim, Miyoung ^b   Pennycook, Stephen J ^c  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CRYSTAL STRUCTURE; ENERGY DISPERSIVE SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; VAPOR PHASE EPITAXY; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

LATTICE SPACING;

NANOSTRUCTURED MATERIALS;

EID: 0037126792     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200290015     Document Type: Article

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