A surface masking technique for the determination of plasma polymer film thickness by afm

Plasmas and Polymers

Volumn 5, Issue 1, 2000, Pages 47-60

  Hartley, Patrick G ^a   Thissen, Helmut ^a   Vaithianathan, Tharshan ^a   Griesser, Hans J ^a  

^a CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DENSITY (SPECIFIC GRAVITY); DEPOSITION; PLASMA POLYMERIZATION; PLASTIC COATINGS; REACTION KINETICS; SUBSTRATES; SURFACE CHEMISTRY; SURFACE TOPOGRAPHY; THICKNESS MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA POLYMER FILM; SURFACE MASKING;

PLASTIC FILMS;

EID: 0034149194     PISSN: 10840184     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1009508426115     Document Type: Article

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