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Volumn 267, Issue 1, 2009, Pages 79-82
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Investigations on the effect of 100 MeV Ni ions irradiated chloride vapour phase epitaxy (Cl-VPE) grown GaN epilayers
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Author keywords
AFM; GaN; Ion irradiation; Photoluminescence; UV visible optical transmission spectrum; X ray diffraction
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
CHLORINE COMPOUNDS;
CRYSTAL GROWTH;
DIFFRACTION;
EPILAYERS;
GALLIUM ALLOYS;
GALLIUM COMPOUNDS;
GALLIUM NITRIDE;
IONS;
IRRADIATION;
LIGHT EMISSION;
LIGHT TRANSMISSION;
LUMINESCENCE;
NICKEL;
NITRIDES;
PHOTOLUMINESCENCE;
PLASMA DIAGNOSTICS;
SEMICONDUCTING GALLIUM;
VAPOR PHASE EPITAXY;
X RAY ANALYSIS;
X RAY DIFFRACTION;
AFM;
AFM IMAGES;
ATOMIC FORCES;
BAND GAPS;
CHLORIDE VAPOUR PHASE EPITAXIES;
FLUENCES;
GALLIUM OXIDES;
GAN;
GAN EPILAYERS;
GAN LAYERS;
ION FLUENCES;
ION IRRADIATION;
NANOCLUSTER FORMATIONS;
NI IONS;
PL MEASUREMENTS;
UV-VISIBLE OPTICAL TRANSMISSION SPECTRUM;
VISIBLE TRANSMITTANCES;
X RAY DIFFRACTION ANALYSIS;
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EID: 58349118269
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nimb.2008.10.077 Document Type: Article |
Times cited : (6)
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References (16)
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