Effect of heat treatment on ITO film properties and ITO/p-Si interface

Materials Chemistry and Physics

Volumn 114, Issue 1, 2009, Pages 425-429

  Balasundaraprabhu, R ^a   Monakhov, E V ^a   Muthukumarasamy, N ^b   Nilsen, O ^a   Svensson, B G ^a  

^a UNIVERSITY OF OSLO   (Norway)

^b Department of Artificial Intelligence and Machine Learning   (India)

Author keywords

Electronic properties; Indium tin oxide; Interface; Structure

Indexed keywords

AMORPHOUS FILMS; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; ELECTRONIC PROPERTIES; HEAT TREATING FURNACES; HEAT TREATMENT; INDIUM; OPTICAL CONDUCTIVITY; OPTICAL PROPERTIES; PHOTODEGRADATION; PHOTOLITHOGRAPHY; STRUCTURAL PROPERTIES; TIN; TITANIUM COMPOUNDS;

CAPACITANCE VOLTAGES; DC MAGNETRON SPUTTERING; DEPOSITED FILMS; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL CONDUCTIVITIES; ELECTRICAL PROPERTIES; ELECTRONIC QUALITIES; HETEROSTRUCTURES; INDIUM TIN OXIDE; INTERFACE; ITO FILMS; OPTICAL TRANSMITTANCES; RAY ANALYSES; ROOM TEMPERATURES; STRUCTURE; TEMPERATURE RANGES;

OPTICAL FILMS;

EID: 58149467487     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2008.09.053     Document Type: Article

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