A mutual calibration method to certify the thickness of nanometre oxide films

Metrologia

Volumn 45, Issue 5, 2008, Pages 507-511

  Kim, Kyung Joong ^a   Kim, Yong Sung ^a   Jang, Jong Shik ^a   Kim, Jeong Won ^a   Kim, Kyoung Won ^b  

^a Korea Research Institute of Standards and Science   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; MAGNETIC FILMS; MOLECULAR BEAM EPITAXY; OXIDE FILMS; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

ATTENUATION LENGTHS; CALIBRATION METHODS; KEY SOLUTIONS; NANOMETRE; OFFSET VALUES; SILICON SUBSTRATES; THICKNESS SCALES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 58149333744     PISSN: 00261394     EISSN: 16817575     Source Type: Journal    
DOI: 10.1088/0026-1394/45/5/003     Document Type: Article

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