Fabrication of line-shaped embossing structure by holographic lithography and its application to electronic device

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 10, 2008, Pages 4945-4950

  Choi, Ho Gil ^a   Yagati, Ajay K ^a   Kim, Ki Seok ^b   Jung, Gun Young ^b   Lee, Sang Baek ^c   Choi, Jeong Woo ^a   Oh, Byung Keun ^a  

^a Sogang University   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

^c Cheju National University ^*  (South Korea)

Author keywords

Bioelectronic device; Holographic lithography; Metalloprotein; Nanostructures

Indexed keywords

AU SUBSTRATES; BIOELECTRONIC DEVICE; CONVENTIONAL LITHOGRAPHIES; COVALENTLY IMMOBILIZED; DOT ARRAYS; ELECTRONIC DEVICES; FINE FEATURES; FINE STRUCTURES; HOLOGRAPHIC LITHOGRAPHY; METALLOPROTEIN; PATTERNED SUBSTRATES; REGULAR ARRAYS; SILICON SUBSTRATES; VERSATILE METHODS;

BIOSENSORS; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL PROPERTIES; FABRICATION; GOLD; LITHOGRAPHY; NANOSTRUCTURES; SCANNING ELECTRON MICROSCOPY;

SUBSTRATES;

GOLD;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRONICS; OXIDATION REDUCTION REACTION; SCANNING ELECTRON MICROSCOPY;

ELECTRONICS; GOLD; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; OXIDATION-REDUCTION;

EID: 58149269504     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.1228     Document Type: Conference Paper

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