Characterization of tin(IV) oxide thin films prepared by atmospheric pressure chemical vapor deposition of cis-[SnCl4{OC(H)OC 2H5}2]

Zeitschrift fur Anorganische und Allgemeine Chemie

Volumn 635, Issue 1, 2009, Pages 53-63

  Talaty, Nari N ^a   Beck, Kristina ^a   Citeau, Helene ^a   Kirschbaum, Kristin ^a   Giolando, Dean M ^a  

^a UNIVERSITY OF TOLEDO   (United States)

Author keywords

Chemical vapor deposition; Oxides (transparent conducting); Single source precursors; Surface chemistry; Thin films; Tin

Indexed keywords

EID: 58149260223     PISSN: 00442313     EISSN: 15213749     Source Type: Journal    
DOI: 10.1002/zaac.200800394     Document Type: Article

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