Atmospheric-pressure chemical vapor deposition of fluorine-doped tin oxide thin films

Thin Solid Films

Volumn 345, Issue 2, 1999, Pages 240-243

  Suh, Seigi ^a   Zhang, Zuhua ^a   Chu, Wei Kan ^a   Hoffman, David M ^a  

^a UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; FLUORINE; GLASS; POLYCRYSTALLINE MATERIALS; QUARTZ; SILICON; STOICHIOMETRY; TIN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; NUCLEAR REACTION ANALYSIS (NRA);

CONDUCTIVE FILMS;

EID: 0032623553     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01421-7     Document Type: Article

References (27)

1. Chopra K.L., Major S., Pandya D.K. Thin Solid Films. 102:1983;1.
2. Laverty S.J., Feng H., Maguire P. J. Electrochem. Soc. 144:1997;2165.
3. Proscia J., Gordon R.G. Thin Solid Films. 214:1992;175.
4. Agashe C., Marathe B.R., Takwale M.G., Bhide V.G. Thin Solid Films. 164:1988;261.
5. Bruneaux J., Cachet H., Froment M., Messad A. Thin Solid Films. 197:1991;129.
6. Morris G.C., McElnea A.E. Appl. Surf. Sci. 92:1996;167.
7. Acosta D.R., Zironi E.P., Montoya E., Estrada W. Thin Solid Films. 288:1996;1.
8. Shanthi E., Banerjee A., Dutta V., Chopra K.L. J. Appl. Phys. 53:1982;1615.
9. Laurent J.-M., Smith A., Smith D.S., Bonnet J.-P., Clemente R.R. Thin Solid Films. 292:1997;145.
10. G.H. Lindner, U.S. Patent 4,696,837 (1987).
11. Mao L., Benoit R.E., Proscia J.W. Mater. Res. Soc. Symp. Proc. 317:1994;181.
12. Saxena A.K., Thangraj R., Singh S.P., Agnihotri O.P. Thin Solid Films. 131:1985;121.
13. Ishida T., Tabata O., il Park J., Shin S.H., Magara H., Tamura S., Mochizuki S., Mihara T. Thin Solid Films. 281-282:1996;228.
14. R.G. Gordon, U.S. Patent, 4,146,657 (1979).
15. Bélanger D., Dodelet J.P., Lombos B.A., Dikson J.I. J. Electrochem. Soc. 132:1985;1398.
16. Athey P.R., Urban III F.K., Holloway P.H. J. Vac. Sci. Technol. B. 14:1996;3436.
17. Maruyama T., Tabata K. J. Appl. Phys. 68:1990;4282.
18. Suh S., Hoffman D.M., Atagi L., Smith D.C., Liu J.-R., Chu W.-K. Chem. Mater. 9:1997;730.
19. Fix R., Gordon R.G., Hoffman D.M. Chem. Mater. 3:1991;1138.
20. Van der Pauw L.J. Philips Res. Rep. 13:1958;1.
21. Peruzzo V., Tagliavini G. J. Organomet. Chem. 66:1974;437.
22. J.E. Dewnurst, J.D. Nicholas, A.C.L. Savoca, U.S. Patent 5, 308,880 (1994).
23. Gordon R.G. Mater. Res. Soc. Symp. Proc. 335:1994;9.
24. Manifacier J.C. Thin Solid Films. 90:1982;297.
25. Liu L. Science. 199:1978;422.
26. Srinivasa Murty N., Jawalekar S.R. Thin Solid Films. 100:1983;219.
27. Cullity B.D. Elements of X-Ray Diffraction. 2nd edn. 1978;Addison-Wesley, CA. p. 102.