Probing and modulating surface electron accumulation in InN by the electrolyte gated Hall effect

Applied Physics Letters

Volumn 93, Issue 26, 2008, Pages

  Brown, G F ^a,b   Ager, J W ^b   Walukiewicz, W ^b   Schaff, W J ^c   Wu, J ^a,b  

^a No 1760   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c School of Chemical and Molecular Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLYTES; GALVANOMAGNETIC EFFECTS; GYRATORS; HALL EFFECT; MULTILAYER FILMS; TRANSPORT PROPERTIES;

DOPED FILMS; ELECTRICAL TRANSPORT PROPERTIES; HOLE RECOMBINATIONS; MULTI-LAYER MODELS; SURFACE ACCUMULATIONS; SURFACE AND INTERFACES; SURFACE CONTRIBUTIONS; SURFACE ELECTRON ACCUMULATIONS;

MAGNETIC FIELD EFFECTS;

EID: 58149234640     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3062856     Document Type: Article

References (17)

1. J. Wu, W. Walukiewicz, K. M. Yu, W. Shan, J. W. Ager III, E. E. Haller, H. Lu, W. J. Schaff, W. K. Metzger, and S. Kurtz, J. Appl. Phys. 0021-8979 10.1063/1.1618353 94, 6477 (2003).
2. S. X. Li, K. M. Yu, J. Wu, R. E. Jones, W. Walukiewicz, J. W. Ager III, W. Shan, E. E. Haller, H. Lu, and W. J. Schaff, Phys. Rev. B 71, 161201 (2005).
3. I. Mahboob, T. D. Veal, C. F. McConville, H. Lu, and W. J. Schaff, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.92.036804 92, 036804 (2004).
4. C. Wu, H. Lee, C. Kuo, C. Chen, and S. Gwo, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.101.106803 101, 106803 (2008).
5. V. Cimalla, V. Lebedev, Ch. Y. Wang, M. Ali, G. Ecke, V. M. Polyakov, F. Schwierz, O. Ambacher, H. Lu, and W. J. Schaff, Appl. Phys. Lett. 0003-6951 10.1063/1.2721365 90, 152106 (2007).
6. H. Lu, W. J. Schaff, and L. F. Eastman, J. Appl. Phys. 0021-8979 10.1063/1.1767608 96, 3577 (2004).
7. T. D. Veal, L. F. J. Piper, I. Mahboob, H. Lu, W. J. Schaff, and C. F. McConville, Phys. Status Solidi C 2, 2246 (2005).
8. P. A. Anderson, C. H. Swartz, D. Carder, R. J. Reeves, S. M. Durbin, S. Chandril, and T. H. Myers, Appl. Phys. Lett. 0003-6951 10.1063/1.2378489 89, 184104 (2006).
9. J. W. L. Yim, R. E. Jones, K. M. Yu, J. W. Ager III, W. Walukiewicz, W. J. Schaff, and J. Wu, Phys. Rev. B 0163-1829 10.1103/PhysRevB.76.041303 76, 041303 (2007).
10. W. J. Schaff, H. Lu, L. F. Eastman, W. Walukiewicz, K. M. Yu, S. Keller, S. Kurtz, B. Keyes, and L. Gevilas, in Proceedings of the Electrochemical Society Meeting, 2004, edited by, V. -H. Ng, and, A. G. Baca, (Electrochemical Society, Pennington, NJ, 2004).
11. H. Shimotani, H. Asanuma, A. Tsukazaki, A. Ohtomo, M. Kawasaki, and Y. Iwasa, Appl. Phys. Lett. 0003-6951 10.1063/1.2772781 91, 082106 (2007).
12. B. Arnaudov, T. Paskova, S. Evtimova, E. Valcheva, M. Heuken, and B. Monemar, Phys. Rev. B 0163-1829 10.1103/PhysRevB.67.045314 67, 045314 (2003).
13. S. P. Fu and Y. F. Chen, Appl. Phys. Lett. 0003-6951 10.1063/1.1787615 85, 1523 (2004).
14. V. Cimalla, V. Lebedev, F. M. Morales, R. Goldhahn, and O. Ambacher, Appl. Phys. Lett. 0003-6951 10.1063/1.2364666 89, 172109 (2006).
15. C. S. Gallinat, G. Koblmuller, J. S. Brown, S. Bernardis, J. S. Speck, G. D. Chern, E. D. Readinger, H. Shen, and M. Wraback, Appl. Phys. Lett. 0003-6951 10.1063/1.2234274 89, 032109 (2006).
16. P. D. C. King, T. D. Veal, C. S. Gallinat, G. Koblmuller, L. R. Bailey, J. S. Speck, and C. F. McConville, J. Appl. Phys. 0021-8979 10.1063/1.3020528 104, 103703 (2008).
17. P. D. C. King, T. D. Veal, and C. F. McConville, Phys. Rev. B 0163-1829 10.1103/PhysRevB.77.125305 77, 125305 (2008).